Electron Beam—Zapit Processing Unit

Current Status of Technology

Advanced Oxidation Technologies, Inc. owns patent of former Zapit Technology, Inc.  Status being determined.

Description of Technology

Electron beam technology has been used for industrial applications for over 30 years.  Zapit Technology, Inc. of Santa Clara, California, developed a gas phase VOC destruction system that is a non-burning, on-site, electron beam technology.  In Zapit’s non-thermal oxidation process, a beam of electrons is passed through a thin window into a reaction chamber where the electrons react with the vapor stream to create free radicals that break down the complex organic molecules.  Adjusting beam power, and the addition of oxidizing agents modifies the DRE of the e-beam.  The system produces carbon dioxide, water and acid gases from halogenated hydrocarbons.  These acids can be neutralized in a caustic scrubber.

 

The system consists of a prototype Zapit Processing Unit (ZPU), containing the following components:

·         Sealed-tube electron beam generator and reaction chamber

·         Sheet electron beam generator

·         High-voltage power supply and control panel

·         Multi-tray air stripper or desorber

·         Packed-bed scrubber or adsorber

·         Activated charcoal adsorbers for both liquid and gas phases

·         On-line analyzers

·         Blower

·         Two 500-gallon polyethylene storage tanks

 

A simplified schematic of the system is shown in figure 1 below.


 


The reaction chamber is cylindrical and approximately 20 inches long and 8 inches in diameter, and constructed of stainless steel.  A 13 inch by 2.5 inch window system along the top of the reactor allows electrons to pass from the electron source vacuum chamber into the vapor stream.  Within the chamber the VOC stream is exposed to 0-20 mA of 170 keV electrons.  Approximately 28% of the power provided by the e-beam source is transmitted into the reaction chamber.  Zapit expects approximately 50% transmission efficiencies in commercial systems.  Gas temperature, pressure, and composition are measured at the outlet of the ZPU reaction chamber.

 

The effluent from the reaction chamber are passed through a caustic scrubber containing continuously recirculating sodium hydroxide.  The scrubber was designed to handle flows up to 500 cfm, however this demonstration had a nominal flow of 3 cfm.  The scrubber effectively removed nitric acid, which can interfere with detection of NOx by chemiluminescent NOx analyzers.  The effluent from the scrubber was passed through a vapor-phase carbon canister before being vented to the atmosphere.

Site and Contaminants Description

Bench scale tests of the electron beam technology were conducted to determine if this technology would be suitable for application at McClellan Air Force base.  Under subcontract with Radian Corporation, the tests were conducted at Zapit Technology at the University of Tennessee’s Space Institute. 

 

Previously Zapit Technologies demonstrated a bench scale system capable of achieving 98% DRE for an entire off gas stream from McClellan’s SVE.  Samples of the off gas were placed in Tedlar bags and transported to Zapit’s test cell.  As a result of this demonstration, McClellan recommended a performance test of a working, flow-through prototype before installing an e-beam pilot unit at McClellan.  The flow-through prototype demonstration was designed in two phases.  Phase I consisted of a bench scale steady-state test on two soil gas mixtures, while phase II would involve an on-site, pilot demonstration following phase I.  Phase I failed to show viability of the technology pilot demonstration at McClellan.  The results of the phase I bench scale test are presented here.

 

The simulated soil gas compositions are listed in table 1 below.

 

Table 1. Simulated Soil Gas Inlet Compositions for Zapit E-Beam Technology

Compound

Mix #1 Concentration (ppmv)

Mix #2 Concentration (ppmv)

1, l, 1-Trichloroethane (TCA)

8

1,657

1,1,2-Trichloroethane (TCA)

30

0

l,l-Dichloroethene (DCE)

15

1,018

1,1 -Dichloroethane (DCA)

0

66

1,2,4-Tnmethylbenzene

0

10

Acetone

15

0

Benzene

10

0

Chlorobenzene

0

4

Freon® 12

0

8

Freon® 113

150

88

Methylene chloride

0

50

Tetrachloroethene (PCE)

300

0

Toluene

70

45

Trichloroethene (TCE)

300

300

cis- 1,2-Dichloroethene (DCE)

200

62

m,p-Xylene

40

2

o-Xylene

95

5

Vinyl chloride

120

30

 

Performance of Technology and DRE

For each of the two gas mixtures, the optimum combination of beam power and promoter dose was calculated to maximize DRE of the VOCs while minimizing NOx formation.  Optimization tests were run at three different beam powers at zero promoter dose, and at three different promoter doses with beam power held constant.  Since the scrubber was oversized the concentration of organic compounds in the scrubber liquid never achieved steady state, and no make-up caustic solution was required to maintain a high pH.  The scrubber appeared to be absorbing organic compounds when the solution was fresh, and desorbing compounds from the liquid to the gas phase after periods where the scrubber received high levels of organic compounds.  Therefore the DREs are calculated based on the effluent from the ZPU and not the scrubber.  Important values for estimating E-beam process emissions are the NOx, HCl, HF and HNO3 concentrations exiting the scrubber.

Field Performance Data

Tables 2 and 3 below present the DREs for the e-beam technology bench scale demonstration of the two different soil gas mixtures.

 

 


Table 2. DREs of the electron beam bench scale technology demonstration for soil gas mixture 2.

Date:

3/29/95

3/29/95

3/29/95

3/30/95

3/30/95

4/6/95

4/7/95

Beam Dose (J/g)

134

268

535

535

507

535

535

Promotor Dose (g/min)

0

0

0

0.6

1.2

0

0

Organic Compound DRE(%)

1, l, 1-Trichloroethane

58.5

65.5

96.9

90.5

96.3

86.7

91.3

1,1-Dichloroethene

99.1

99.4

99.5

99.7

99.7

99.3

99.3

l,l-Dichloroethane

66.8

85.4

99.0

99.9

99.9

95.2

99.9

1,2,4-Tnmethylbenzene

98.3

96.5

63.0

98.6

97.9

ND

85.6

Chlorobenzene

20.8

52.0

91.6

98.1

98.1

95.1

96.5

Freon® 12

49.2

54.1

85.3

75.8

80.2